EHT power systems can be used for a variety of thin film applications including solar and display. Our power systems can be used to bias surfaces to produce directional fluxes of particles for sputtering and evaporation. Additionally, these power systems can be used to produce nonthermal plasmas for atmospheric-pressure plasma-enhanced chemical vapor deposition. These techniques allow for precise control over the properties of the deposited materials, which can enhance the efficiency of the resulting thin films.